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Technical glossary´╝ÜOther

Photo mask, glass mask

A photomask is a pattern formed by a thin film of light-blocking material on a light-permeable substrate. The photomask is used to transfer the pattern to the photoresist layer on the metal surface by exposure. We use polyester film masks (so-called emulsion masks) or glass masks in some cases. By mainly using film masks, which we process inhouse, we can produce prototypes in as little as two days.