The process of dissolving and removing of the remaining photoresist left on the surface of the material after exposure. When using negative photoresist, the exposed areas remain in the image. When using positive photoresist, the unexposed areas remain in the image. In our company, developing solution is sprayed in a developing machine, followed by rinsing and heat treatment (post-baking). Heating after development is used to harden the photoresist areas and make them more resistant to the chemical solution. Please contact us for further information or questions.